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Intel may drop the use of a high-k dielectric in the transistor gate stack at the 45nm manufacturing process node and is working on a second high-k material, with a yet higher dielectric constant (five times higher than that of silicon dioxide). The engineers were being encouraged to find a different engineering solution to the...

The post Intel High-k Dielectric Strategy appeared first on VR-Zone.

Intel High-k Dielectric Strategy

Intel may drop the use of a high-k dielectric in the transistor gate stack at the 45nm manufacturing process node and is working on a second high-k material, with a yet higher dielectric constant (five times higher than that of silicon dioxide). The engineers were being encouraged to find a different engineering solution to the...

The post Intel High-k Dielectric Strategy appeared first on VR-Zone.