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Intel has introduced a new technique of shaping transistors on die to reduce leakage current even on smaller upcoming processes. Intel announced that the tri-gate (3D) transistor for high-volume manufacturing has been introduced into production. Since these transistors improve performance and energy efficiency, the company expects tri-gate technology to become the basic building block for...

The post Tri-gate Transistors To Lower Leakage Current appeared first on VR-Zone.

Tri-gate Transistors To Lower Leakage Current

Intel has introduced a new technique of shaping transistors on die to reduce leakage current even on smaller upcoming processes. Intel announced that the tri-gate (3D) transistor for high-volume manufacturing has been introduced into production. Since these transistors improve performance and energy efficiency, the company expects tri-gate technology to become the basic building block for...

The post Tri-gate Transistors To Lower Leakage Current appeared first on VR-Zone.